Title/Place of Publication
7368
2007.01.30 10:56
10.1063/1.1864245
X-ray Diffraction Measurements of Internal Strain in Si Nanowires Fabricated using a Self-Limiting Oxidation Process
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Applied Physics Letters
86 7 2005 071903
Authors
 
First Author 0001281 Shimura Takayoshi Osaka University
Coauthor 1 Yasutake Kiyoshi Osaka University
Coauthor 2 0005066 Umeno Masataka Fukui University of Technology
Coauthor 3 Nagase Masao NTT Basic Research Laboratories
Related Proposal Information
2000B0068 BL09XU 志村 考功