Title/Place of Publication
6539
2007.01.30 10:56
10.2472/jsms.53.728
https://doi.org/10.2472/jsms.53.728
In-situ Synchrotron Measurement of Thermal Stress in Textured Copper Thin Films during Thermal Cycling
Refereed Journals, Doctoral Thesis, Refereed Proceedings
材料 (Journal of the Society of Materials Science, Japan)
53 7 2004 728-733
Authors
 
First Author 0005201 Tanaka Keisuke Nagoya University
Coauthor 1 0006323 Ito Toshimasa Denso Corporation
Coauthor 2 0006230 Akiniwa Yoshiaki Nagoya University
Coauthor 3 Ohta Hitoyuki Hitachi, Ltd.
Related Proposal Information
2002A0281 BL02B1 田中 啓介