Title/Place of Publication
39554
2020.03.06 10:51
10.1016/j.jcrysgro.2017.01.004
Observation of Double Shockley Stacking Fault Expansion in Heavily-Nitrogen-Doped 4H-SiC using PL Technique
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Journal of Crystal Growth
468 2017 889-893
[A80] Industrial Applications
[M60] X-ray Imaging
Authors
 
First Author 0039591 Tokuda Yuichiro National Institute of Advanced Industrial Science and Technology, Denso Corporation, Kyoto University
Coauthor 1 0009160 Kamata Isaho Central Research Institute of Electric Power Industry
Coauthor 2 Hoshino N. Central Research Institute of Electric Power Industry
Coauthor 3 0005408 Kato Tomohisa National Institute of Advanced Industrial Science and Technology
Coauthor 4 0020091 Okumura Hajime National Institute of Advanced Industrial Science and Technology
Coauthor 5 Kimoto T. Kyoto University
Coauthor 6 0013411 Tsuchida Hidekazu Central Research Institute of Electric Power Industry
Related Proposal Information
2016B3321 BL08B2 鎌田 功穂
2016A3321 BL08B2 鎌田 功穂
2015B3321 BL08B2 鎌田 功穂
2015A3321 BL08B2 鎌田 功穂