Title/Place of Publication
39553
2020.03.06 10:27
10.4028/www.scientific.net/MSF.924.180
X-Ray Topography Analysis of 4H-SiC Crystals Grown by the High-Temperature Gas Source Method
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Materials Science Forum
924 2018 180
[A80] Industrial Applications
[M60] X-ray Imaging
Authors
 
First Author 0009160 Kamata Isaho Central Research Institute of Electric Power Industry
Coauthor 1 Hoshino Norihiro
Coauthor 2 0039591 Tokuda Yuichiro National Institute of Advanced Industrial Science and Technology
Coauthor 3 Makino Emi
Coauthor 4 0006527 Sugiyama Naohiro National Institute of Advanced Industrial Science and Technology
Coauthor 5 Kuno Hironari
Coauthor 6 Kojima Jun
Coauthor 7 0013411 Tsuchida Hidekazu Central Research Institute of Electric Power Industry
Related Proposal Information
2016B3321 BL08B2 鎌田 功穂
2017A3321 BL08B2 鎌田 功穂
2017B3321 BL08B2 鎌田 功穂
2018A3321 BL08B2 鎌田 功穂