User Information

Title/Place of Publication
Publication ID	38444
Date Created	2019.08.21 08:31
DOI	10.1063/1.5091501
Open Access URL
English Title	Reconstruction of IrO₂/(Pb, La)(Zr, Ti)O₃ (PLZT) Interface by Optimization of Postdeposition Annealing and Sputtering Conditions
Type of Publication	Refereed Journals, Doctoral Thesis, Refereed Proceedings
Place of Publication (Journal)	Journal Title Journal of Applied Physics Vol. 126 No. 7 Year of Publication 2019 Page 074105
Place of Publication (Oral, Poster)	Conference Title Date Venue
Research Area	[A80] Industrial Applications
Research Method	[M10] X-ray Diffraction

Authors
	User Card ID No.	Last/Family	First/Given	Affiliation
First Author	0003409	Nomura	Kenji	Fujitsu Laboratories, Ltd.
Coauthor 1		Wang	Wensheng	Fujitsu Semiconductor, Ltd.
Coauthor 2		Nakamura	Ko	Fujitsu Semiconductor, Ltd.
Coauthor 3		Eshita	Takashi	Fujitsu Semiconductor, Ltd., Wakayama University
Coauthor 4		Takai	Kazuaki	Fujitsu Semiconductor, Ltd.
Coauthor 5		Ozawa	Soichiro	Fujitsu Semiconductor, Ltd.
Coauthor 6		Yamaguchi	Hideshi	Fujitsu Laboratories, Ltd.
Coauthor 7		Mihara	Satoru	Fujitsu Semiconductor, Ltd.
Coauthor 8		Hikosaka	Yukinobu	Fujitsu Semiconductor, Ltd.
Coauthor 9		Saito	Hitoshi	Fujitsu Semiconductor, Ltd.
Coauthor 10		Kataoka	Yuji	Fujitsu Laboratories, Ltd.
Coauthor 11		Kojima	Manabu	Fujitsu Semiconductor, Ltd.

Related Proposal Information
Proposal Number 2018A5110 Beamline BL16XU Project Leader 淡路直樹
Proposal Number 2018B5110 Beamline BL16XU Project Leader 土井修一