Title/Place of Publication
36843
2018.09.27 19:44
10.7567/JJAP.57.11UA01
Development of Highly Reliable Ferroelectric Random Access Memory and its Internet of Things Applications
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Japanese Journal of Applied Physics
57 11S 2018 11UA01
[A80] Industrial Applications
[M10] X-ray Diffraction
Authors
 
First Author Eshita Takashi Wakayama University, Fujitsu Semiconductor, Ltd.
Coauthor 1 Wang Wensheng Fujitsu Semiconductor, Ltd.
Coauthor 2 0003409 Nomura Kenji Fujitsu Laboratories, Ltd.
Coauthor 3 Nakamura Ko Fujitsu Semiconductor, Ltd.
Coauthor 4 Saito Hitoshi Fujitsu Semiconductor, Ltd.
Coauthor 5 Yamaguchi Hideshi Fujitsu Laboratories, Ltd.
Coauthor 6 Mihara Satoru Fujitsu Semiconductor, Ltd.
Coauthor 7 Hikosaka Yukinobu Fujitsu Semiconductor, Ltd.
Coauthor 8 Kataoka Yuji Fujitsu Laboratories, Ltd.
Coauthor 9 Kojima Manabu Fujitsu Semiconductor, Ltd.
Related Proposal Information
2018A5110 BL16XU 淡路 直樹
2017B5110 BL16XU 淡路 直樹