Title/Place of Publication
35968
2018.04.23 10:48
10.7567/APEX.7.065502
High-speed, High-quality Crystal Growth of 4H-SiC by High-temperature Gas Source Method
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Applied Physics Express
7 6 2014 065502
[A80] Industrial Applications
[M60] X-ray Imaging
Authors
 
First Author Hoshino Norihiro Central Research Institute of Electric Power Industry
Coauthor 1 0009160 Kamata Isaho Central Research Institute of Electric Power Industry
Coauthor 2 0039591 Tokuda Yuichiro R&D Partnership for Future Power Electronics Technology, Denso Corporation
Coauthor 3 Makino Emi R&D Partnership for Future Power Electronics Technology, Denso Corporation
Coauthor 4 0006527 Sugiyama Naohiro R&D Partnership for Future Power Electronics Technology, Denso Corporation
Coauthor 5 Kojima Jun R&D Partnership for Future Power Electronics Technology, Denso Corporation
Coauthor 6 0013411 Tsuchida Hidekazu Central Research Institute of Electric Power Industry
Related Proposal Information
2016A3321 BL08B2 鎌田 ċŠŸçİ‚