Title/Place of Publication
Publication ID
21009
Date Created
2012.02.21 18:50
DOI
10.1063/1.3679553
Open Access URL
English Title
Densification of Chemical Vapor Deposition Silicon Dioxide Film Using Oxygen Radical Oxidation
Type of Publication
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Place of Publication (Journal)
Journal Title
Journal of Applied Physics
Vol.
111
No.
3
Year of Publication
2012
Page
034101
Place of Publication (Oral, Poster)
Conference Title
Date
Venue
Research Area
[A10] Life Science
Research Method
X線反射率
Authors
User Card ID No.
Last/Family
First/Given
Affiliation
Corresponding
Author
First Author
0005022
Kawase
Kazumasa
Mitsubishi Electric Corporation
Coauthor 1
0015560
Teramoto
Akinobu
Tohoku University
Coauthor 2
Umeda
Hiroshi
Renesas electronics Corporation
Coauthor 3
0018695
Suwa
Tomoyuki
Tohoku University
Coauthor 4
0004121
Uehara
Yasushi
Mitsubishi Electric Corporation
Coauthor 5
0007880
Hattori
Takeo
Tohoku University
Coauthor 6
Ohmi
Tadahiro
Tohoku University
Related Proposal Information
Proposal Number
2010A5131
Beamline
BL16XU
Project Leader
河瀬 和雅
Proposal Number
2010B5131
Beamline
BL16XU
Project Leader
河瀬 和雅