Title/Place of Publication
Publication ID
20247
Date Created
2011.10.31 16:21
DOI
10.1016/j.sab.2009.05.016
Open Access URL
English Title
High-sensitivity X-ray Absorption Fine Structure Investigation of Arsenic Shallow Implant in Silicon
Type of Publication
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Place of Publication (Journal)
Journal Title
Spectrochimica Acta Part B
Vol.
64
No.
8
Year of Publication
2009
Page
808-811
Place of Publication (Oral, Poster)
Conference Title
Date
Venue
Research Area
[A10] Life Science
Research Method
Authors
User Card ID No.
Last/Family
First/Given
Affiliation
Corresponding
Author
First Author
0008496
Yamazaki
Hideyuki
Toshiba Corporation
Coauthor 1
0004423
Yoshiki
Masahiko
Toshiba Corporation
Coauthor 2
0003152
Takemura
Momoko
Toshiba Corporation
Coauthor 3
Tomita
M.
Toshiba Corporation
Coauthor 4
Takeno
S.
Toshiba Corporation
Related Proposal Information
Proposal Number
2005B5060
Beamline
BL16XU
Project Leader
山崎 英之
Proposal Number
2006A5060
Beamline
BL16XU
Project Leader
山崎 英之
Proposal Number
2006B5060
Beamline
BL16XU
Project Leader
山崎 英之
Proposal Number
2007A5060
Beamline
BL16XU
Project Leader
山崎 英之