Title/Place of Publication
16796
2010.04.22 19:02
10.1143/JJAP.49.04DD11
Study of Charge Trap Sites in SiN Films by Hard X-ray Photoelectron Spectroscopy
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Japanese Journal of Applied Physics
49 4 2010 04DD11
[A10] Life Science
Authors
 
First Author 0015901 Kosemura Daisuke Meiji University
Coauthor 1 0020331 Takei Munehisa Meiji University
Coauthor 2 Nagata Kohki Meiji University
Coauthor 3 0023947 Akamatsu Hiroaki Meiji University
Coauthor 4 0022858 Hattori Maki Meiji University
Coauthor 5 Katayama Daisuke Tokyo Electron AT
Coauthor 6 0024071 Nishita Tatsuo Tokyo Electron AT
Coauthor 7 Hirota Yoshihiro Tokyo Electron AT
Coauthor 8 0005913 Machida Masatake SPring-8/JASRI
Coauthor 9 0000618 Son JinYoung SPring-8/JASRI
Coauthor 10 0005256 Koganezawa Tomoyuki SPring-8/JASRI
Coauthor 11 0002088 Hirosawa Ichiro SPring-8/JASRI
Coauthor 12 0015928 Ogura Atsushi Meiji University
Related Proposal Information
2008B1917 BL46XU 小椋 厚志
2008B2073 BL46XU 小椋 厚志