Title/Place of Publication
Publication ID
155
Date Created
2007.01.30 10:55
DOI
10.7567/JJAPS.38S1.191
Open Access URL
English Title
XANES Analysis of Optical Activation Process of Er in Si: Er
2
O
3
Thin Film: Electronic and Structural Modifications around Er
Type of Publication
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Place of Publication (Journal)
Journal Title
Japanese Journal of Applied Physics
Vol.
38
No.
Supple.
Year of Publication
1999
Page
191-194
Place of Publication (Oral, Poster)
Conference Title
International Conference on Synchrotron Radiation in Materials Science (SRMS)
Date
1998.10.31-11.03
Venue
Kobe, Japan
Research Area
Research Method
Authors
User Card ID No.
Last/Family
First/Given
Affiliation
Corresponding
Author
First Author
0001178
Ishii
Masashi
JASRI
Coauthor 1
0003906
Komuro
Shuji
Toyo University
Coauthor 2
Morikawa
Takitaro
Toyo University
Coauthor 3
Aoyagi
Yoshinobu
RIKEN
Coauthor 4
0000179
Ishikawa
Tetsuya
JASRI
Coauthor 5
0000070
Ueki
Tatzuo
JASRI
Related Proposal Information
Proposal Number
1998A0134
Beamline
BL10XU
Project Leader
石井 真史