Title/Place of Publication
Publication ID
14532
Date Created
2009.08.18 15:12
DOI
10.1149/1.3122447
Open Access URL
English Title
Improvement of CVD SiO
2
by Post Deposition Microwave Plasma Treatment
Type of Publication
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Place of Publication (Journal)
Journal Title
ECS Transactions
Vol.
19
No.
9
Year of Publication
2009
Page
45-51
Place of Publication (Oral, Poster)
Conference Title
Date
Venue
Research Area
[A10] Life Science
Research Method
Authors
User Card ID No.
Last/Family
First/Given
Affiliation
Corresponding
Author
First Author
0023948
Nagata
Kohki
Meiji University
Coauthor 1
0023947
Akamatsu
Hiroaki
Meiji University
Coauthor 2
0015901
Kosemura
Daisuke
Meiji University
Coauthor 3
0019092
Yoshida
Tetsuya
Meiji University
Coauthor 4
0020331
Takei
Munehisa
Meiji University
Coauthor 5
0022858
Hattori
Maki
Meiji University
Coauthor 6
0015928
Ogura
Atsushi
Meiji University
Coauthor 7
0005256
Koganezawa
Tomoyuki
SPring-8/JASRI
Coauthor 8
0005913
Machida
Masatake
SPring-8/JASRI
Coauthor 9
0000618
Son
JinYoung
SPring-8/JASRI
Coauthor 10
0002088
Hirosawa
Ichiro
SPring-8/JASRI
Coauthor 11
Shiozawa
T.
Tokyo Electron AT, Ltd.
Coauthor 12
Katayama
D.
Tokyo Electron AT, Ltd.
Coauthor 13
Sato
Y.
Tokyo Electron AT, Ltd.
Coauthor 14
Hirota
Y.
Tokyo Electron AT, Ltd.
Related Proposal Information
Proposal Number
2008B1917
Beamline
BL46XU
Project Leader
小椋 厚志
Proposal Number
2008B2073
Beamline
BL46XU
Project Leader
小椋 厚志