Title/Place of Publication
12098
2008.02.04 20:52
10.1088/1742-6596/83/1/012009
Oxidation Process Dependence of Strain Field under the SiO2/Si(001) Interface Revealed by X-ray Multiple-wave Diffraction
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Journal of Physics: Conference Series
83 2007 012009
埋もれた界面のX線・中性子線解析に関するワークショップ 2007 (’Buried’ Interface Science with X-rays and Neutrons 2007)
2007.07.22-07.24 Sendai, Japan
Authors
 
First Author 0003297 Yashiro Wataru The University of Tokyo
Coauthor 1 0001245 Yoda Yoshitaka SPring-8/JASRI
Coauthor 2 0008044 Takahashi Kensuke Musashi Institute of Technology
Coauthor 3 0015559 Yamamoto Masashi Tohoku University
Coauthor 4 0007880 Hattori Takeo Tohoku University
Coauthor 5 0004138 Miki Kazushi National Institute for Materials Science
Related Proposal Information
2006A1492 BL09XU 矢代 航
2005B0483 BL09XU 矢代 航
2005A0635 BL09XU 矢代 航