Title/Place of Publication
Publication ID
10135
Date Created
2007.01.30 10:57
DOI
10.1063/1.2353781
Open Access URL
English Title
Detailed Structural Analysis and Dielectric Properties of Silicon Nitride Film Fabricated Using Pure Nitrogen Plasma Generated Near Atmospheric Pressure
Type of Publication
Refereed Journals, Doctoral Thesis, Refereed Proceedings
Place of Publication (Journal)
Journal Title
Journal of Applied Physics
Vol.
100
No.
7
Year of Publication
2006
Page
073710
Place of Publication (Oral, Poster)
Conference Title
Date
Venue
Research Area
Research Method
Authors
User Card ID No.
Last/Family
First/Given
Affiliation
Corresponding
Author
First Author
Hayakawa
Ryoma
Osaka Prefecture University
Coauthor 1
Nakae
Mari
Osaka Prefecture University
Coauthor 2
Yoshimura
Takeshi
Osaka Prefecture University
Coauthor 3
Ashida
Atsushi
Osaka Prefecture University
Coauthor 4
Fujimura
Norifumi
Osaka Prefecture University
Coauthor 5
Uehara
Tsuyoshi
Sekisui Chenical Co., Ltd.
Coauthor 6
0002812
Tagawa
Masahito
Kobe University
Coauthor 7
0000390
Teraoka
Yuden
JAEA
Related Proposal Information
Proposal Number
2005B0102
Beamline
BL23SU
Project Leader
田川 雅人